Rapid thermal anneal activates light induced degradation due to copper redistribution

N. Nampalli, H. S. Laine, J. Colwell, V. Vähänissi, A. Inglese, C. Modanese, H. Vahlman, M. Yli-Koski, H. Savin*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

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