Quantum and classical molecular dynamics studies of the threshold displacement energy in Si bulk and nanowire

E. Holmström*, A. V. Krasheninnikov, K. Nordlund

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

4 Citations (Scopus)

Abstract

Using quantum mechanical and classical molecular dynamics computer simulations, we study the full three-dimensional threshold displacement energy surface in Si. We show that the SIESTA density-functional theory method gives a minimum threshold energy of 13 eV that agrees very well with experiments, and predicts an average threshold displacement energy of 36 eV. Using the quantum mechanical result as a baseline, we discuss the reliability of the classical potentials with respect to their description of the threshold energies. We also examine the threshold energies for sputtering in a nanowire, and find that this threshold depends surprisingly strongly on which layer the atom is in.

Original languageEnglish
Title of host publicationIon Beams and Nano-Engineering
Pages111-122
Number of pages12
Volume1181
Publication statusPublished - 21 May 2010
MoE publication typeA4 Conference publication
EventMaterials Research Society Spring Meeting - San Francisco, United States
Duration: 13 Apr 200917 Apr 2009

Conference

ConferenceMaterials Research Society Spring Meeting
Abbreviated titleMRS
Country/TerritoryUnited States
CitySan Francisco
Period13/04/200917/04/2009

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