Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications

Maria Berdova*, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Luca Lamagna, Stefano Losa, Silvia Rossini, Roberto Somaschini, Salvatore Gioveni, Marco Fanciulli, Sami Franssila

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

6 Citations (Scopus)

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Physics & Astronomy

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Chemical Compounds