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Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications
Maria Berdova*, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Luca Lamagna, Stefano Losa, Silvia Rossini, Roberto Somaschini, Salvatore Gioveni, Marco Fanciulli, Sami Franssila
*Corresponding author for this work
Research output: Contribution to journal › Article › Scientific › peer-review
6
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(Scopus)