Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications

Maria Berdova; Claudia Wiemer; Alessio Lamperti; Grazia Tallarida; Elena Cianci; Luca Lamagna; Stefano Losa; Silvia Rossini; Roberto Somaschini; Salvatore Gioveni; Marco Fanciulli; Sami Franssila

doi:10.1016/j.apsusc.2016.01.216

Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications

Maria Berdova^*, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Luca Lamagna, Stefano Losa, Silvia Rossini, Roberto Somaschini, Salvatore Gioveni, Marco Fanciulli, Sami Franssila

^*Corresponding author for this work

Department of Chemistry and Materials Science

Research output: Contribution to journal › Article › Scientific › peer-review

6 Citations (Scopus)

Abstract

This work presents the investigation of HfO₂ deposited by atomic layer deposition (ALD) from either HfD-CO4 or TEMAHf and ozone for microelectromechanical systems (MEMS) applications, in particular, for environmental protection of aluminum micromirrors. This work shows that HfO₂ films successfully protect aluminum in moist environment and at the same time retain good reflectance properties of underlying material. In our experimental work, the chemical composition, crystal structure, electronic density and roughness of HfO₂ films remained the same after one week of humidity treatment (relative humidity of 85%, 85 °C). The reflectance properties underwent only minor changes. The observed shift in reflectance was only from 80-90% to 76-85% in 400-800 nm spectral range when coated with ALD HfO₂ films grown with Hf(NMeEt)₄ and no shift (remained in the range of 68-83%) for films grown from (CpMe)₂Hf(OMe)Me.

Original language	English
Pages (from-to)	470-476
Number of pages	7
Journal	Applied Surface Science
Volume	368
DOIs	https://doi.org/10.1016/j.apsusc.2016.01.216
Publication status	Published - 15 Apr 2016
MoE publication type	A1 Journal article-refereed

Keywords

Atomic layer deposition
Hafnium dioxide
HfO
Humidity treatment
Reflectance

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Berdova, Maria ; Wiemer, Claudia ; Lamperti, Alessio ; Tallarida, Grazia ; Cianci, Elena ; Lamagna, Luca ; Losa, Stefano ; Rossini, Silvia ; Somaschini, Roberto ; Gioveni, Salvatore ; Fanciulli, Marco ; Franssila, Sami. / Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications. In: Applied Surface Science. 2016 ; Vol. 368. pp. 470-476.

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title = "Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications",

abstract = "This work presents the investigation of HfO2 deposited by atomic layer deposition (ALD) from either HfD-CO4 or TEMAHf and ozone for microelectromechanical systems (MEMS) applications, in particular, for environmental protection of aluminum micromirrors. This work shows that HfO2 films successfully protect aluminum in moist environment and at the same time retain good reflectance properties of underlying material. In our experimental work, the chemical composition, crystal structure, electronic density and roughness of HfO2 films remained the same after one week of humidity treatment (relative humidity of 85%, 85 °C). The reflectance properties underwent only minor changes. The observed shift in reflectance was only from 80-90% to 76-85% in 400-800 nm spectral range when coated with ALD HfO2 films grown with Hf(NMeEt)4 and no shift (remained in the range of 68-83%) for films grown from (CpMe)2Hf(OMe)Me.",

keywords = "Atomic layer deposition, Hafnium dioxide, HfO, Humidity treatment, Reflectance",

author = "Maria Berdova and Claudia Wiemer and Alessio Lamperti and Grazia Tallarida and Elena Cianci and Luca Lamagna and Stefano Losa and Silvia Rossini and Roberto Somaschini and Salvatore Gioveni and Marco Fanciulli and Sami Franssila",

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doi = "10.1016/j.apsusc.2016.01.216",

language = "English",

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Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications. / Berdova, Maria; Wiemer, Claudia; Lamperti, Alessio; Tallarida, Grazia; Cianci, Elena; Lamagna, Luca; Losa, Stefano; Rossini, Silvia; Somaschini, Roberto; Gioveni, Salvatore; Fanciulli, Marco; Franssila, Sami.

In: Applied Surface Science, Vol. 368, 15.04.2016, p. 470-476.

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications

AU - Berdova, Maria

AU - Wiemer, Claudia

AU - Lamperti, Alessio

AU - Tallarida, Grazia

AU - Cianci, Elena

AU - Lamagna, Luca

AU - Losa, Stefano

AU - Rossini, Silvia

AU - Somaschini, Roberto

AU - Gioveni, Salvatore

AU - Fanciulli, Marco

AU - Franssila, Sami

PY - 2016/4/15

Y1 - 2016/4/15

N2 - This work presents the investigation of HfO2 deposited by atomic layer deposition (ALD) from either HfD-CO4 or TEMAHf and ozone for microelectromechanical systems (MEMS) applications, in particular, for environmental protection of aluminum micromirrors. This work shows that HfO2 films successfully protect aluminum in moist environment and at the same time retain good reflectance properties of underlying material. In our experimental work, the chemical composition, crystal structure, electronic density and roughness of HfO2 films remained the same after one week of humidity treatment (relative humidity of 85%, 85 °C). The reflectance properties underwent only minor changes. The observed shift in reflectance was only from 80-90% to 76-85% in 400-800 nm spectral range when coated with ALD HfO2 films grown with Hf(NMeEt)4 and no shift (remained in the range of 68-83%) for films grown from (CpMe)2Hf(OMe)Me.

AB - This work presents the investigation of HfO2 deposited by atomic layer deposition (ALD) from either HfD-CO4 or TEMAHf and ozone for microelectromechanical systems (MEMS) applications, in particular, for environmental protection of aluminum micromirrors. This work shows that HfO2 films successfully protect aluminum in moist environment and at the same time retain good reflectance properties of underlying material. In our experimental work, the chemical composition, crystal structure, electronic density and roughness of HfO2 films remained the same after one week of humidity treatment (relative humidity of 85%, 85 °C). The reflectance properties underwent only minor changes. The observed shift in reflectance was only from 80-90% to 76-85% in 400-800 nm spectral range when coated with ALD HfO2 films grown with Hf(NMeEt)4 and no shift (remained in the range of 68-83%) for films grown from (CpMe)2Hf(OMe)Me.

KW - Atomic layer deposition

KW - Hafnium dioxide

KW - HfO

KW - Humidity treatment

KW - Reflectance

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DO - 10.1016/j.apsusc.2016.01.216

M3 - Article

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VL - 368

SP - 470

EP - 476

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

ER -

Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications

Abstract

Keywords

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