Properties of AlN grown by plasma enhanced atomic layer deposition

Research output: Contribution to journalArticleScientificpeer-review

Researchers

Research units

  • University of Jyväskylä
  • Beneq Oy

Details

Original languageEnglish
Pages (from-to)7827-7830
Number of pages4
JournalApplied Surface Science
Volume257
Issue number17
Publication statusPublished - 15 Jun 2011
MoE publication typeA1 Journal article-refereed

    Research areas

  • Aluminum nitride, Atomic Layer Deposition, Plasma

ID: 887756