Properties of AlN grown by plasma enhanced atomic layer deposition

Markus Bosund, Timo Sajavaara, Mikko Laitinen, Teppo Huhtio, Matti Putkonen, Veli-Matti Airaksinen, Harri Lipsanen

Research output: Contribution to journalArticleScientificpeer-review

108 Citations (Scopus)
Original languageEnglish
Pages (from-to)7827-7830
Number of pages4
JournalApplied Surface Science
Issue number17
Publication statusPublished - 15 Jun 2011
MoE publication typeA1 Journal article-refereed


  • Aluminum nitride
  • Atomic Layer Deposition
  • Plasma

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