Properties of AlN grown by plasma enhanced atomic layer deposition

Markus Bosund, Timo Sajavaara, Mikko Laitinen, Teppo Huhtio, Matti Putkonen, Veli-Matti Airaksinen, Harri Lipsanen

Research output: Contribution to journalArticleScientificpeer-review

88 Citations (Scopus)
Original languageEnglish
Pages (from-to)7827-7830
Number of pages4
JournalApplied Surface Science
Volume257
Issue number17
DOIs
Publication statusPublished - 15 Jun 2011
MoE publication typeA1 Journal article-refereed

Keywords

  • Aluminum nitride
  • Atomic Layer Deposition
  • Plasma

Cite this