Properties of AlN Film Grown by Plasma Enhanced Atomic Layer Deposition

M. Bosund, Matti Putkonen, Timo Sajavaara, Mikko I. Laitinen, T. Huhtio, V-M. Airaksinen, H. Lipsanen

Research output: Working paperProfessional

54 Citations (Scopus)
Original languageEnglish
Publication statusPublished - 2011
MoE publication typeD4 Published development or research report or study

Cite this