Processing of Y2O3 Thin Films by Atomic Layer Deposition from Cyclopentadienyl-type Compounds and Water as Precursors

Jaakko Niinistö, Matti Putkonen, Lauri Niinistö

    Research output: Contribution to journalArticleScientificpeer-review

    91 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)2953-2958
    JournalChemistry of Materials
    Volume16
    Publication statusPublished - 2004
    MoE publication typeA1 Journal article-refereed

    Keywords

    • Atomic layer deposition (ALD)
    • cyclopentadienyl precursors
    • thin films

    Cite this