@article{4f3ac723b0f447b3a433b57b3e319b8b,
title = "Processing of Y2O3 Thin Films by Atomic Layer Deposition from Cyclopentadienyl-type Compounds and Water as Precursors",
keywords = "Atomic layer deposition (ALD), cyclopentadienyl precursors, thin films, Atomic layer deposition (ALD), cyclopentadienyl precursors, thin films, Atomic layer deposition (ALD), cyclopentadienyl precursors, thin films",
author = "Jaakko Niinist{\"o} and Matti Putkonen and Lauri Niinist{\"o}",
year = "2004",
language = "English",
volume = "16",
pages = "2953--2958",
journal = "Chemistry of Materials",
issn = "0897-4756",
publisher = "AMERICAN CHEMICAL SOCIETY",
}