Procedure and apparatus for improving a plasma accelerator plating apparatus used for diamond plating

Asko Anttila (Inventor), Jari Koskinen (Inventor)

Research output: Patent

Abstract

PCT No. PCT/FI92/00366 Sec. 371 Date Nov. 9, 1994 Sec. 102(e) Date Nov. 9, 1994 PCT Filed Dec. 30, 1992 PCT Pub. No. WO93/14239 PCT Pub. Date Jul. 22, 1993.A plating apparatus used in a diamond plating process in which a first electrode having a surface from which plating material is released is located in connection with a firing electrode to generate a first arc, the first arc being used to start a second arc between the first electrode and a second electrode, and in which apparatus a plasma spray formed from plating material released from the first electrode is directed toward a substrate to be plated includes a grinding element in contact with the surface of the first electrode and a mechanism for rotating the surface of the first electrode. The grinding element may be a firing electrode or an abrading tool. A method of operating the plating apparatus includes abrading the surface of the first electrode from which plating material is released.

Original languageEnglish
Patent numberUS5518596
IPCH05H 1/ 50 A I
Priority date30/12/1992
Publication statusPublished - 21 May 1996
MoE publication typeH1 Granted patent

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