Precise chemical analysis developement for Silicon water after rapid thermal processing

D. Lioubtchenko, T.A. Brianteseva, Z.M. Lebedeva, I.A. Markov, M. Nolan, T.S. Perova, R.A. Moore

    Research output: Contribution to journalArticleScientificpeer-review

    4 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)21-25
    JournalApplied Surface Science
    Issue number156
    Publication statusPublished - 2000
    MoE publication typeA1 Journal article-refereed

    Keywords

    • photometry
    • rapid thermal processing
    • silicon

    Cite this