(poster) Ozone-based batch atomic layer deposited Al2O3 for effective surface passivation

Guillaume von Gastrow, Shuo Li, Päivikki Repo, Yameng Bao, Matti Putkonen, Hele Savin

Research output: Contribution to conferenceAbstractScientificpeer-review

Original languageEnglish
Publication statusPublished - 2013
MoE publication typeNot Eligible
EventInternational Conference on Crystalline Silicon Photovoltaics - Hamelin, Germany
Duration: 25 Mar 201327 Mar 2013

Conference

ConferenceInternational Conference on Crystalline Silicon Photovoltaics
Abbreviated titleSiliconPV
Country/TerritoryGermany
CityHamelin
Period25/03/201327/03/2013

Keywords

  • Atomic layer deposition
  • ozone
  • aluminum oxide
  • Si surface passivation

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