(poster) Modification of chemical oxide passivation of silicon by ultrahigh-vacuum low-temperature treatments

Zahra Jahanshah Rad; Kexun Chen; Juha Pekka Lehtiö; Iris Mack; Esa Vuorinen; Ville Vähänissi; Mikhail Kuzmin; M.P.J. Punkkinen; Pekka Laukkanen; Hele Savin; Kalevi Kokko

(poster) Modification of chemical oxide passivation of silicon by ultrahigh-vacuum low-temperature treatments

Zahra Jahanshah Rad^*, Kexun Chen, Juha Pekka Lehtiö, Iris Mack, Esa Vuorinen, Ville Vähänissi, Mikhail Kuzmin, M.P.J. Punkkinen, Pekka Laukkanen, Hele Savin, Kalevi Kokko

^*Corresponding author for this work

University of Turku

Research output: Contribution to conference › Poster › Scientific

Original language	English
Publication status	Published - 17 Dec 2020
MoE publication type	Not Eligible
Event	IEEE Semiconductor Interface Specialists Conference - Virtual, Online, Virtual, Online, United States Duration: 16 Dec 2020 → 18 Dec 2020 Conference number: 51 https://www.ieeesisc.org/

Conference

Conference	IEEE Semiconductor Interface Specialists Conference
Abbreviated title	IEEE SISC
Country/Territory	United States
City	Virtual, Online
Period	16/12/2020 → 18/12/2020
Internet address	https://www.ieeesisc.org/

OpenUrl availability

Full text

OtaNano
Anna Rissanen (Manager)
Aalto University
Facility/equipment: Facility
OtaNano - Nanofab
Päivikki Repo (Manager)
OtaNano
Facility/equipment: Facility

Cite this

Rad, Z. J., Chen, K., Lehtiö, J. P., Mack, I., Vuorinen, E., Vähänissi, V., Kuzmin, M., Punkkinen, M. P. J., Laukkanen, P., Savin, H., & Kokko, K. (2020). (poster) Modification of chemical oxide passivation of silicon by ultrahigh-vacuum low-temperature treatments. Poster session presented at IEEE Semiconductor Interface Specialists Conference, Virtual, Online, United States.

@conference{bb45efcaf4c7456993171904acc5d696,

title = "(poster) Modification of chemical oxide passivation of silicon by ultrahigh-vacuum low-temperature treatments",

author = "Rad, {Zahra Jahanshah} and Kexun Chen and Lehti{\"o}, {Juha Pekka} and Iris Mack and Esa Vuorinen and Ville V{\"a}h{\"a}nissi and Mikhail Kuzmin and M.P.J. Punkkinen and Pekka Laukkanen and Hele Savin and Kalevi Kokko",

year = "2020",

month = dec,

day = "17",

language = "English",

note = "IEEE Semiconductor Interface Specialists Conference, IEEE SISC ; Conference date: 16-12-2020 Through 18-12-2020",

url = "https://www.ieeesisc.org/",

}

TY - CONF

T1 - (poster) Modification of chemical oxide passivation of silicon by ultrahigh-vacuum low-temperature treatments

AU - Rad, Zahra Jahanshah

AU - Chen, Kexun

AU - Lehtiö, Juha Pekka

AU - Mack, Iris

AU - Vuorinen, Esa

AU - Vähänissi, Ville

AU - Kuzmin, Mikhail

AU - Punkkinen, M.P.J.

AU - Laukkanen, Pekka

AU - Savin, Hele

AU - Kokko, Kalevi

N1 - Conference code: 51

PY - 2020/12/17

Y1 - 2020/12/17

M3 - Poster

T2 - IEEE Semiconductor Interface Specialists Conference

Y2 - 16 December 2020 through 18 December 2020

ER -

(poster) Modification of chemical oxide passivation of silicon by ultrahigh-vacuum low-temperature treatments

Conference

OpenUrl availability

Equipment

OtaNano

OtaNano - Nanofab

Cite this