(poster) Efficient surface passivation of black silicon using spatial atomic layer deposition

Research output: Contribution to conference › Abstract › Scientific › peer-review

Original language	English
Publication status	Published - 2017
MoE publication type	Not Eligible
Event	International Conference on Crystalline Silicon Photovoltaics - Freiburg, Germany, Freiburg, Germany Duration: 3 Apr 2017 → 5 Apr 2017 Conference number: 7 http://siliconpv.com/home.html

Conference	International Conference on Crystalline Silicon Photovoltaics
Abbreviated title	SiliconPV 2017
Country/Territory	Germany
City	Freiburg
Period	03/04/2017 → 05/04/2017
Internet address	http://siliconpv.com/home.html

Keywords

@conference{3b7f62850d964432939f213892e62f50,

title = "(poster) Efficient surface passivation of black silicon using spatial atomic layer deposition",

keywords = "spatial atomic layer deposition, nanostructured silicon, high surface area, surface passivation, conformal coating, aluminum oxide",

author = "Ismo Heikkinen and P{\"a}ivikki Repo and Ville V{\"a}h{\"a}nissi and Toni Pasanen and Ville Malinen and Hele Savin",

year = "2017",

language = "English",

note = "International Conference on Crystalline Silicon Photovoltaics, SiliconPV 2017 ; Conference date: 03-04-2017 Through 05-04-2017",

url = "http://siliconpv.com/home.html",

}

TY - CONF

T1 - (poster) Efficient surface passivation of black silicon using spatial atomic layer deposition

AU - Heikkinen, Ismo

AU - Repo, Päivikki

AU - Vähänissi, Ville

AU - Pasanen, Toni

AU - Malinen, Ville

AU - Savin, Hele

N1 - Conference code: 7

PY - 2017

Y1 - 2017

KW - spatial atomic layer deposition

KW - nanostructured silicon

KW - high surface area

KW - surface passivation

KW - conformal coating

KW - aluminum oxide

M3 - Abstract

T2 - International Conference on Crystalline Silicon Photovoltaics

Y2 - 3 April 2017 through 5 April 2017

ER -