Positron annihilation studies of nitride films modified by ion bombardement: In search for a cause of stress-relaxation

R. Nowak; T. Fält; K. Heiskanen; J. E. Frackowiak; H. Morawiec; C. L. Li; A. Hirvonen; T. Sekino; K. Niihara

doi:10.1142/9789812702913_0070

Positron annihilation studies of nitride films modified by ion bombardement: In search for a cause of stress-relaxation

R. Nowak, T. Fält, K. Heiskanen, J. E. Frackowiak, H. Morawiec, C. L. Li, A. Hirvonen, T. Sekino, K. Niihara

Research output: Chapter in Book/Report/Conference proceeding › Chapter › Scientific › peer-review

Original language	English
Title of host publication	APPLIED CRYSTALLIGRAPHY
Subtitle of host publication	Proceedings of the XIX Conference
Editors	Henryk Morawiec, Danuta Stroz
Place of Publication	Singapore
Publisher	World Scientific
Pages	355-359
Number of pages	5
ISBN (Electronic)	978-981-4483-21-6
ISBN (Print)	981-238-761-7, 978-981-238-761-5
DOIs	https://doi.org/10.1142/9789812702913_0070
Publication status	Published - 2004
MoE publication type	A3 Book section, Chapters in research books
Event	Conference on Applied Crystallography - Cracow, Poland Duration: 1 Sept 2003 → 4 Sept 2003 Conference number: 19

Conference

Conference	Conference on Applied Crystallography
Country/Territory	Poland
City	Cracow
Period	01/09/2003 → 04/09/2003

Keywords

positron annihilation
thin films
vacancies

Access to Document

10.1142/9789812702913_0070

Cite this

Nowak, R., Fält, T., Heiskanen, K., Frackowiak, J. E., Morawiec, H., Li, C. L., Hirvonen, A., Sekino, T., & Niihara, K. (2004). Positron annihilation studies of nitride films modified by ion bombardement: In search for a cause of stress-relaxation. In H. Morawiec, & D. Stroz (Eds.), APPLIED CRYSTALLIGRAPHY: Proceedings of the XIX Conference (pp. 355-359). World Scientific. https://doi.org/10.1142/9789812702913_0070

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title = "Positron annihilation studies of nitride films modified by ion bombardement: In search for a cause of stress-relaxation",

keywords = "positron annihilation, thin films, vacancies, positron annihilation, thin films, vacancies, positron annihilation, thin films, vacancies",

author = "R. Nowak and T. F{\"a}lt and K. Heiskanen and Frackowiak, {J. E.} and H. Morawiec and Li, {C. L.} and A. Hirvonen and T. Sekino and K. Niihara",

year = "2004",

doi = "10.1142/9789812702913_0070",

language = "English",

isbn = "981-238-761-7",

pages = "355--359",

editor = "Henryk Morawiec and Danuta Stroz",

booktitle = "APPLIED CRYSTALLIGRAPHY",

publisher = "World Scientific",

address = "United States",

note = "Conference on Applied Crystallography ; Conference date: 01-09-2003 Through 04-09-2003",

}

Nowak, R, Fält, T, Heiskanen, K, Frackowiak, JE, Morawiec, H, Li, CL, Hirvonen, A, Sekino, T & Niihara, K 2004, Positron annihilation studies of nitride films modified by ion bombardement: In search for a cause of stress-relaxation. in H Morawiec & D Stroz (eds), APPLIED CRYSTALLIGRAPHY: Proceedings of the XIX Conference. World Scientific, Singapore, pp. 355-359, Conference on Applied Crystallography, Cracow, Poland, 01/09/2003. https://doi.org/10.1142/9789812702913_0070

Positron annihilation studies of nitride films modified by ion bombardement: In search for a cause of stress-relaxation. / Nowak, R.; Fält, T.; Heiskanen, K. et al.
APPLIED CRYSTALLIGRAPHY: Proceedings of the XIX Conference. ed. / Henryk Morawiec; Danuta Stroz. Singapore: World Scientific, 2004. p. 355-359.

Research output: Chapter in Book/Report/Conference proceeding › Chapter › Scientific › peer-review

TY - CHAP

T1 - Positron annihilation studies of nitride films modified by ion bombardement: In search for a cause of stress-relaxation

AU - Nowak, R.

AU - Fält, T.

AU - Heiskanen, K.

AU - Frackowiak, J. E.

AU - Morawiec, H.

AU - Li, C. L.

AU - Hirvonen, A.

AU - Sekino, T.

AU - Niihara, K.

N1 - Conference code: 19

PY - 2004

Y1 - 2004

KW - positron annihilation

KW - thin films

KW - vacancies

KW - positron annihilation

KW - thin films

KW - vacancies

KW - positron annihilation

KW - thin films

KW - vacancies

U2 - 10.1142/9789812702913_0070

DO - 10.1142/9789812702913_0070

M3 - Chapter

SN - 981-238-761-7

SN - 978-981-238-761-5

SP - 355

EP - 359

BT - APPLIED CRYSTALLIGRAPHY

A2 - Morawiec, Henryk

A2 - Stroz, Danuta

PB - World Scientific

CY - Singapore

T2 - Conference on Applied Crystallography

Y2 - 1 September 2003 through 4 September 2003

ER -