Plasma etching in microdevice fabrication: thin film and process integration aspects.

    Research output: Contribution to journalArticleScientificpeer-review

    Original languageEnglish
    Pages (from-to)1-41
    JournalActa Polytechnica Scandinavica
    Issue numberEl 81
    Publication statusPublished - 1995
    MoE publication typeA1 Journal article-refereed

    Keywords

    • plasma etching, microelectronics

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