Plasma etched initial pits for electrochemically etched macroporous silicon structures

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Plasma etched initial pits for electrochemically etched macroporous silicon structures. / Grigoras, Kestutis; Niskanen, Antti; Franssila, Sami.

In: Journal of Micromechanics and Microengineering, Vol. 11, 2001, p. 371-375.

Research output: Contribution to journalArticleScientificpeer-review

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@article{d7d0b70b02764ed5a9f1a698cae9c40a,
title = "Plasma etched initial pits for electrochemically etched macroporous silicon structures",
keywords = "etching, KOH, macroporous, RIE, silicon, etching, KOH, macroporous, RIE, silicon, etching, KOH, macroporous, RIE, silicon",
author = "Kestutis Grigoras and Antti Niskanen and Sami Franssila",
year = "2001",
language = "English",
volume = "11",
pages = "371--375",
journal = "Journal of Micromechanics and Microengineering",
issn = "0960-1317",
publisher = "IOP Publishing Ltd.",

}

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TY - JOUR

T1 - Plasma etched initial pits for electrochemically etched macroporous silicon structures

AU - Grigoras, Kestutis

AU - Niskanen, Antti

AU - Franssila, Sami

PY - 2001

Y1 - 2001

KW - etching

KW - KOH

KW - macroporous

KW - RIE

KW - silicon

KW - etching

KW - KOH

KW - macroporous

KW - RIE

KW - silicon

KW - etching

KW - KOH

KW - macroporous

KW - RIE

KW - silicon

M3 - Article

VL - 11

SP - 371

EP - 375

JO - Journal of Micromechanics and Microengineering

JF - Journal of Micromechanics and Microengineering

SN - 0960-1317

ER -

ID: 3428243