Plasma etched carbon microelectrode arrays for bioelectrical measurements

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Plasma etched carbon microelectrode arrays for bioelectrical measurements. / Heikkinen, Joonas J.; Kaarela, Tiina; Ludwig, Anastasia; Sukhanova, Tatiana; Khakipoor, Shokoufeh; Kim, Sung Il; Han, Jeon Geon; Huttunen, Henri J.; Rivera, Claudio; Lauri, Sari E.; Taira, Tomi; Jokinen, Ville; Franssila, Sami.

In: Diamond and Related Materials, Vol. 90, 01.11.2018, p. 126-134.

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Heikkinen, JJ, Kaarela, T, Ludwig, A, Sukhanova, T, Khakipoor, S, Kim, SI, Han, JG, Huttunen, HJ, Rivera, C, Lauri, SE, Taira, T, Jokinen, V & Franssila, S 2018, 'Plasma etched carbon microelectrode arrays for bioelectrical measurements', Diamond and Related Materials, vol. 90, pp. 126-134. https://doi.org/10.1016/j.diamond.2018.09.024

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Heikkinen, Joonas J. ; Kaarela, Tiina ; Ludwig, Anastasia ; Sukhanova, Tatiana ; Khakipoor, Shokoufeh ; Kim, Sung Il ; Han, Jeon Geon ; Huttunen, Henri J. ; Rivera, Claudio ; Lauri, Sari E. ; Taira, Tomi ; Jokinen, Ville ; Franssila, Sami. / Plasma etched carbon microelectrode arrays for bioelectrical measurements. In: Diamond and Related Materials. 2018 ; Vol. 90. pp. 126-134.

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@article{05c835af6fe54621b19a87e8f1cba17a,
title = "Plasma etched carbon microelectrode arrays for bioelectrical measurements",
abstract = "Carbon-based materials have attracted much attention in biological applications like interfacing electrodes with neurons and cell growth platforms due to their natural biocompatibility and tailorable material properties. Here we have fabricated sputtered carbon thin film electrodes for bioelectrical measurements. Reactive ion etching (RIE) recipes were optimized with Taguchi method to etch the close field unbalanced magnetron sputtered carbon thin film (nanocarbon, nC) consisting of nanoscale crystalline sp2-domains in amorphous sp3-bonded backbone. Plasma etching processes used gas mixtures of Ar/O2/SF6/CHF3 for RIE and O2/SF6 for ICP-RIE. The highest achieved etch rate for nanocarbon was ≫389 nm/min and best chromium etch mask selectivity was 135:1. Biocompatibility of the material was tested with rat neuronal cultures. Next, we fabricated multielectrode arrays (MEA) with carbon recording electrodes and metal wiring. Organotypic brain slices grown on the MEAs were viable and showed characteristic spontaneous electrical network activity. The results demonstrate that interactions with nanocarbon substrate support neuronal survival and maturation of functional neuronal networks. Thus the material can have wide applications in biomedical research.",
keywords = "Carbon, ICP-RIE, Multielectrode array, Neuronal networks, Neurons, Reactive ion etching",
author = "Heikkinen, {Joonas J.} and Tiina Kaarela and Anastasia Ludwig and Tatiana Sukhanova and Shokoufeh Khakipoor and Kim, {Sung Il} and Han, {Jeon Geon} and Huttunen, {Henri J.} and Claudio Rivera and Lauri, {Sari E.} and Tomi Taira and Ville Jokinen and Sami Franssila",
year = "2018",
month = "11",
day = "1",
doi = "10.1016/j.diamond.2018.09.024",
language = "English",
volume = "90",
pages = "126--134",
journal = "Diamond and Related Materials",
issn = "0925-9635",
publisher = "Elsevier BV",

}

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TY - JOUR

T1 - Plasma etched carbon microelectrode arrays for bioelectrical measurements

AU - Heikkinen, Joonas J.

AU - Kaarela, Tiina

AU - Ludwig, Anastasia

AU - Sukhanova, Tatiana

AU - Khakipoor, Shokoufeh

AU - Kim, Sung Il

AU - Han, Jeon Geon

AU - Huttunen, Henri J.

AU - Rivera, Claudio

AU - Lauri, Sari E.

AU - Taira, Tomi

AU - Jokinen, Ville

AU - Franssila, Sami

PY - 2018/11/1

Y1 - 2018/11/1

N2 - Carbon-based materials have attracted much attention in biological applications like interfacing electrodes with neurons and cell growth platforms due to their natural biocompatibility and tailorable material properties. Here we have fabricated sputtered carbon thin film electrodes for bioelectrical measurements. Reactive ion etching (RIE) recipes were optimized with Taguchi method to etch the close field unbalanced magnetron sputtered carbon thin film (nanocarbon, nC) consisting of nanoscale crystalline sp2-domains in amorphous sp3-bonded backbone. Plasma etching processes used gas mixtures of Ar/O2/SF6/CHF3 for RIE and O2/SF6 for ICP-RIE. The highest achieved etch rate for nanocarbon was ≫389 nm/min and best chromium etch mask selectivity was 135:1. Biocompatibility of the material was tested with rat neuronal cultures. Next, we fabricated multielectrode arrays (MEA) with carbon recording electrodes and metal wiring. Organotypic brain slices grown on the MEAs were viable and showed characteristic spontaneous electrical network activity. The results demonstrate that interactions with nanocarbon substrate support neuronal survival and maturation of functional neuronal networks. Thus the material can have wide applications in biomedical research.

AB - Carbon-based materials have attracted much attention in biological applications like interfacing electrodes with neurons and cell growth platforms due to their natural biocompatibility and tailorable material properties. Here we have fabricated sputtered carbon thin film electrodes for bioelectrical measurements. Reactive ion etching (RIE) recipes were optimized with Taguchi method to etch the close field unbalanced magnetron sputtered carbon thin film (nanocarbon, nC) consisting of nanoscale crystalline sp2-domains in amorphous sp3-bonded backbone. Plasma etching processes used gas mixtures of Ar/O2/SF6/CHF3 for RIE and O2/SF6 for ICP-RIE. The highest achieved etch rate for nanocarbon was ≫389 nm/min and best chromium etch mask selectivity was 135:1. Biocompatibility of the material was tested with rat neuronal cultures. Next, we fabricated multielectrode arrays (MEA) with carbon recording electrodes and metal wiring. Organotypic brain slices grown on the MEAs were viable and showed characteristic spontaneous electrical network activity. The results demonstrate that interactions with nanocarbon substrate support neuronal survival and maturation of functional neuronal networks. Thus the material can have wide applications in biomedical research.

KW - Carbon

KW - ICP-RIE

KW - Multielectrode array

KW - Neuronal networks

KW - Neurons

KW - Reactive ion etching

UR - http://www.scopus.com/inward/record.url?scp=85055121341&partnerID=8YFLogxK

U2 - 10.1016/j.diamond.2018.09.024

DO - 10.1016/j.diamond.2018.09.024

M3 - Article

VL - 90

SP - 126

EP - 134

JO - Diamond and Related Materials

JF - Diamond and Related Materials

SN - 0925-9635

ER -

ID: 29118054