Pattern shape effects and artefacts in deep silicon etching

J. Kiihamäki, Sami Franssila

Research output: Contribution to journal › Article › Scientific › peer-review

84 Citations (Scopus)

Original language	English
Pages (from-to)	2280-2285
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	A17
Issue number	4
DOIs	https://doi.org/10.1116/1.581761
Publication status	Published - 1999
MoE publication type	A1 Journal article-refereed

Keywords

@article{336d68db87ae40f1abf06d7089aa455d,

title = "Pattern shape effects and artefacts in deep silicon etching",

keywords = "silicon etching, silicon etching, silicon etching",

author = "J. Kiiham{\"a}ki and Sami Franssila",

year = "1999",

doi = "10.1116/1.581761",

language = "English",

volume = "A17",

pages = "2280--2285",

journal = "JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A",

issn = "0734-2101",

publisher = "American Institute of Physics",

number = "4",

}

TY - JOUR

T1 - Pattern shape effects and artefacts in deep silicon etching

AU - Kiihamäki, J.

AU - Franssila, Sami

PY - 1999

Y1 - 1999

KW - silicon etching

U2 - 10.1116/1.581761

DO - 10.1116/1.581761

M3 - Article

VL - A17

SP - 2280

EP - 2285

JO - JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A

JF - JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A

SN - 0734-2101

IS - 4

ER -