Passivation of black silicon boron emitters with atomic layer deposited aluminum oxide

Päivikki Repo, Jan Benick, Guillaume von Gastrow, Ville Vähänissi, Friedemann D. Heinz, Jonas Schön, Martin C. Schubert, Hele Savin

Research output: Contribution to journalArticleScientificpeer-review

23 Citations (Scopus)
39 Downloads (Pure)
Original languageEnglish
Pages (from-to)950-954
JournalPhysica Status Solidi - Rapid Research Letters
Issue number11
Publication statusPublished - 2013
MoE publication typeA1 Journal article-refereed


  • Al2O3
  • black silicon
  • boron diffusion
  • surface passivation

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