Passivation of black silicon boron emitters with atomic layer deposited aluminum oxide

Päivikki Repo, Jan Benick, Guillaume von Gastrow, Ville Vähänissi, Friedemann D. Heinz, Jonas Schön, Martin C. Schubert, Hele Savin

Research output: Contribution to journalArticleScientificpeer-review

18 Citations (Scopus)
21 Downloads (Pure)
Original languageEnglish
Pages (from-to)950-954
JournalPHYSICA STATUS SOLIDI: RAPID RESEARCH LETTERS
Volume7
Issue number11
DOIs
Publication statusPublished - 2013
MoE publication typeA1 Journal article-refereed

Keywords

  • Al2O3
  • black silicon
  • boron diffusion
  • surface passivation

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OtaNano

Anna Rissanen (Manager)

Aalto University

Facility/equipment: Facility

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