Oxide thin films by ALD for advanced applications

Lauri Niinistö

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publicationAVS Topical Conference On Atomic Layer Deposition, Hanyang Institute of Technology, Hanyang University, Seoul, Korea, August 19-21, 2002
    PublisherAmerican Vacuum Society Topical Conference
    Pages25
    Publication statusPublished - 2002
    MoE publication typeA4 Article in a conference publication

    Keywords

    • ALD
    • oxides
    • thin films

    Cite this