Organic-Inorganic Thin Films from TiCl4 and 4-Aminophenol Precursors: A Model Case of ALD/MLD Hybrid-Material Growth?

Pia Sundberg, Maarit Karppinen*

*Corresponding author for this work

    Research output: Contribution to journalEditorialScientific

    Abstract

    Invited for the cover of this issue are Pia Sundberg and Maarit Karppinen from the Aalto University, Finland. The cover image shows the deposition cycle of a (Ti-O-C6H4-N=)(n)-type thin film grown by a combined atomic and molecular layer deposition (ALD/MLD) technique with TiCl4 and 4-aminophenol as precursors.

    Original languageEnglish
    Pages (from-to)950-950
    Number of pages1
    JournalEuropean Journal of Inorganic Chemistry
    Volume2014
    Issue number6
    DOIs
    Publication statusPublished - Feb 2014
    MoE publication typeB1 Article in a scientific magazine

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