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(oral talk) Nanometer-scale depth-resolved ALD SiO2 thin films by GDOES

  • Zhen Zhu*
  • , Chiara Modanese
  • , Perttu Sippola
  • , Marisa Di Sabatino
  • , Hele Savin
  • *Corresponding author for this work
  • Beneq Oy
  • Norwegian University of Science and Technology

Research output: Contribution to conferenceAbstractScientificpeer-review

Original languageEnglish
Publication statusPublished - 2017
MoE publication typeNot Eligible
EventALTECH EMRS Symposium: Analytical techniques for precise characterization of nano materials - Strasbourg, France
Duration: 22 May 201726 May 2017

Conference

ConferenceALTECH EMRS Symposium
Country/TerritoryFrance
CityStrasbourg
Period22/05/201726/05/2017

Keywords

  • atomic layer deposition
  • glow discharge optical emission spectroscopy
  • SiO
  • thin films

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