(oral talk) Efficient surface passivation of black silicon using spatial atomic layer deposition

Research output: Contribution to conferenceAbstractScientificpeer-review

Original languageEnglish
Publication statusPublished - 2017
MoE publication typeNot Eligible
EventInternational Conference on Atomic Layer Deposition - Denver, Colorado, United States
Duration: 15 Jul 201718 Jul 2017
Conference number: 17


ConferenceInternational Conference on Atomic Layer Deposition
Abbreviated titleALD 2017
Country/TerritoryUnited States
CityDenver, Colorado


  • spatial atomic layer deposition
  • nanostructured silicon
  • high surface area
  • surface passivation
  • conformal coating
  • aluminum oxide

Cite this