Optimization of growth parameters for the deposition of AlCl3 and Al2O3 on silica by atomic layer epitaxy

M. Nieminen, L. Niinistö

    Research output: Working paperProfessional

    Original languageEnglish
    Place of PublicationHelsinki
    Publication statusPublished - 1996
    MoE publication typeD4 Published development or research report or study

    Publication series

    NameThe 9th Symposium on Inorganic and Analytical Chemistry, Helsinki, 24.5.1996
    PublisherDepartment of Chemistry, University of Helsinki


    • ale
    • aluminium chloride
    • aluminium oxide
    • atomic layer epitaxy
    • silica

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