@techreport{4766bebe5f144cb68dea880211626b22,
title = "Optimization of growth parameters for the deposition of AlCl3 and Al2O3 on silica by atomic layer epitaxy",
keywords = "ale, aluminium chloride, aluminium oxide, atomic layer epitaxy, silica, ale, aluminium chloride, aluminium oxide, atomic layer epitaxy, silica, ale, aluminium chloride, aluminium oxide, atomic layer epitaxy, silica",
author = "M. Nieminen and L. Niinist{\"o}",
year = "1996",
language = "English",
series = "The 9th Symposium on Inorganic and Analytical Chemistry, Helsinki, 24.5.1996",
publisher = "Department of Chemistry, University of Helsinki",
pages = "53",
type = "WorkingPaper",
institution = "Department of Chemistry, University of Helsinki",
}