Optical scatterometry with neural network model for nondestructive measurement of submicron features

I. Kallioniemi, J. Saarinen

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    11 Citations (Scopus)
    Original languageEnglish
    Title of host publicationIn-line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing, Edinburgh, Skotlanti, Iso-Britannia, 19.-21. toukokuuta 1999.
    EditorsK. Amberiadis, G. Kissinger, K. Okumura, S. Pabbisetty, L. H. Weiland
    PublisherSPIE - The International Society for Optical Engineering
    Pages33-40
    Publication statusPublished - 1999
    MoE publication typeA4 Article in a conference publication

    Keywords

    • diffractive optics
    • neural networks
    • optical scatterometry

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