Optical Interference Lithography Using Azobenzene-Functionalized Polymers for Micro- and Nanopatterning of Silicon

Research output: Contribution to journalArticleScientificpeer-review

Researchers

Research units

  • Tokyo Institute of Technology

Details

Original languageEnglish
Pages (from-to)4174-4177
Number of pages4
JournalAdvanced Materials
Volume23
Issue number36
Publication statusPublished - 22 Sep 2011
MoE publication typeA1 Journal article-refereed

    Research areas

  • azobenzene, lithography, nanopatterning, surface-relief grating

ID: 711418