Optical and structural properties of SiOx films grown by molecular beam deposition: Effect of the Si concentration and annealing temperature

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Original languageEnglish
JournalJournal of Applied Physics
Issue number112
Publication statusPublished - 2012
MoE publication typeA1 Journal article-refereed

    Research areas

  • Silicon nanocrystals, Raman, X-ray photoelectron, spectroscopy

ID: 881224