Optical and structural properties of SiOx films grown by molecular beam deposition: Effect of the Si concentration and annealing temperature

Timur Nikitin; Rama Velagapudi; Jani Sainio; Jouko Lahtinen; Markku Räsänen; Sergei Novikov; Leonid Khriachtchev

doi:10.1063/1.4764893

Optical and structural properties of SiOx films grown by molecular beam deposition: Effect of the Si concentration and annealing temperature

Timur Nikitin, Rama Velagapudi, Jani Sainio, Jouko Lahtinen, Markku Räsänen, Sergei Novikov, Leonid Khriachtchev

Research output: Contribution to journal › Article › Scientific › peer-review

21 Citations (Scopus)

Original language	English
Journal	Journal of Applied Physics
Issue number	112
DOIs	https://doi.org/10.1063/1.4764893
Publication status	Published - 2012
MoE publication type	A1 Journal article-refereed

Keywords

Silicon nanocrystals, Raman, X-ray photoelectron
spectroscopy

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10.1063/1.4764893

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title = "Optical and structural properties of SiOx films grown by molecular beam deposition: Effect of the Si concentration and annealing temperature",

keywords = "Silicon nanocrystals, Raman, X-ray photoelectron, spectroscopy, Silicon nanocrystals, Raman, X-ray photoelectron, spectroscopy, Silicon nanocrystals, Raman, X-ray photoelectron, spectroscopy",

author = "Timur Nikitin and Rama Velagapudi and Jani Sainio and Jouko Lahtinen and Markku R{\"a}s{\"a}nen and Sergei Novikov and Leonid Khriachtchev",

year = "2012",

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journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

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T1 - Optical and structural properties of SiOx films grown by molecular beam deposition: Effect of the Si concentration and annealing temperature

AU - Nikitin, Timur

AU - Velagapudi, Rama

AU - Sainio, Jani

AU - Lahtinen, Jouko

AU - Räsänen, Markku

AU - Novikov, Sergei

AU - Khriachtchev, Leonid

PY - 2012

Y1 - 2012

KW - Silicon nanocrystals, Raman, X-ray photoelectron

KW - spectroscopy

KW - Silicon nanocrystals, Raman, X-ray photoelectron

KW - spectroscopy

KW - Silicon nanocrystals, Raman, X-ray photoelectron

KW - spectroscopy

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U2 - 10.1063/1.4764893

DO - 10.1063/1.4764893

M3 - Article

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 112

ER -

Optical and structural properties of SiOx films grown by molecular beam deposition: Effect of the Si concentration and annealing temperature

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