One-Antenna Radiation Pattern Measurement of On-Wafer Antennas in Probe Station Environment

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Abstract

We propose and demonstrate the use of radiation pattern measurement method for on-wafer antennas for the first time that is capable of in-depth antenna characterization with limited equipment. This one-antenna method extracts gain without the need for a second antenna in the on-wafer probe station environment. A combination of reference reflector translation and rotation allows radiation pattern sampling at multiple angles enabling characterization over the relevant solid angle. Several microstrip patch antennas with varying beam directions (0˚, 20˚, and 30˚) were measured with the proposed method over 120˚ in the H-plane with good agreement between simulation and experiment. The method offers a cost-effective and time-efficient solution for probe-fed, on-wafer antenna radiation performance characterization.
Original languageEnglish
Pages (from-to)31-39
Number of pages9
JournalPROGRESS IN ELECTROMAGNETICS RESEARCH-PIER
Volume167
Publication statusPublished - 15 Mar 2020
MoE publication typeA1 Journal article-refereed

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  • OtaNano

    Anna Rissanen (Manager)

    Aalto University

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