On the reliability of nanoindentation hardness of Al2O3 films grown on Si-wafer by atomic layer deposition

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  • VTT Technical Research Centre of Finland

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Original languageEnglish
Article number01A116
Pages (from-to)1-6
Number of pages6
JournalJOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A
Volume32
Issue number1
Publication statusPublished - 2014
MoE publication typeA1 Journal article-refereed

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ID: 752211