Nucleation and growth of cobalt disilicide precipitates during in-situ TEM implantation and annealing

M.-O. Ruault, V.A. Borodin, Maria Ganchenkova, F. Fortuna

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
JournalJournal of Applied Physics
Volume104
Publication statusPublished - 2008
MoE publication typeA1 Journal article-refereed

Keywords

  • cobalt, silicon, TEM, simulation

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