Novel nanostructure replication process for robust superhydrophobic surfaces

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review


Research units


This paper reports a novel nanoreplication process. It consists of metal nanostructuring by acidic etching, atomic layer deposition (ALD) of TiO2 and polymer replication. Due to excellent conformality of ALD, the nanostructures are accurately covered. After polydimethylsiloxane (PDMS) casting, the metal is completely etched away, revealing the nanostructured TiO2/PDMS surface. Because no peeling is used, even retrograde structures can be released easily. The surface is superhydrophobic, and it repels water, wine and coffee. The surface is both flexible and damage tolerant: it retains its Cassie-state superhydrophobicity even after wear and damage.


Original languageEnglish
Title of host publicationProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Publication statusPublished - 26 Feb 2016
MoE publication typeA4 Article in a conference publication
EventIEEE International Conference on Micro Electro Mechanical Systems - Shanghai, China
Duration: 24 Jan 201628 Jan 2016
Conference number: 29

Publication series

ISSN (Print)1084-6999


ConferenceIEEE International Conference on Micro Electro Mechanical Systems
Abbreviated titleMEMS

    Research areas

  • Robust superhydrophobic, Atomic layer deposition (ALD), nanoreplication, titania-coated polymers

ID: 4630732