Novel nanostructure replication process for robust superhydrophobic surfaces

Sasha Hoshian; Ville Jokinen; Sami Franssila

doi:10.1109/MEMSYS.2016.7421683

Novel nanostructure replication process for robust superhydrophobic surfaces

Sasha Hoshian^*, Ville Jokinen, Sami Franssila

^*Corresponding author for this work

Department of Chemistry and Materials Science

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

2 Citations (Scopus)

Abstract

This paper reports a novel nanoreplication process. It consists of metal nanostructuring by acidic etching, atomic layer deposition (ALD) of TiO2 and polymer replication. Due to excellent conformality of ALD, the nanostructures are accurately covered. After polydimethylsiloxane (PDMS) casting, the metal is completely etched away, revealing the nanostructured TiO2/PDMS surface. Because no peeling is used, even retrograde structures can be released easily. The surface is superhydrophobic, and it repels water, wine and coffee. The surface is both flexible and damage tolerant: it retains its Cassie-state superhydrophobicity even after wear and damage.

Original language	English
Title of host publication	Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Publisher	IEEE
Pages	547-549
Number of pages	3
ISBN (Electronic)	9781509019731
DOIs	https://doi.org/10.1109/MEMSYS.2016.7421683
Publication status	Published - 26 Feb 2016
MoE publication type	A4 Article in a conference publication
Event	IEEE International Conference on Micro Electro Mechanical Systems - Shanghai, China Duration: 24 Jan 2016 → 28 Jan 2016 Conference number: 29

Publication series

Name
ISSN (Print)	1084-6999

Conference

Conference	IEEE International Conference on Micro Electro Mechanical Systems
Abbreviated title	MEMS
Country	China
City	Shanghai
Period	24/01/2016 → 28/01/2016

Keywords

Robust superhydrophobic
Atomic layer deposition (ALD)
nanoreplication
titania-coated polymers

Access to Document

10.1109/MEMSYS.2016.7421683

Link to publication in Scopus

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Facility/equipment: Facility
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School of Chemical Engineering
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Cite this

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title = "Novel nanostructure replication process for robust superhydrophobic surfaces",

abstract = "This paper reports a novel nanoreplication process. It consists of metal nanostructuring by acidic etching, atomic layer deposition (ALD) of TiO2 and polymer replication. Due to excellent conformality of ALD, the nanostructures are accurately covered. After polydimethylsiloxane (PDMS) casting, the metal is completely etched away, revealing the nanostructured TiO2/PDMS surface. Because no peeling is used, even retrograde structures can be released easily. The surface is superhydrophobic, and it repels water, wine and coffee. The surface is both flexible and damage tolerant: it retains its Cassie-state superhydrophobicity even after wear and damage.",

keywords = "Robust superhydrophobic, Atomic layer deposition (ALD), nanoreplication, titania-coated polymers",

author = "Sasha Hoshian and Ville Jokinen and Sami Franssila",

year = "2016",

month = feb,

day = "26",

doi = "10.1109/MEMSYS.2016.7421683",

language = "English",

publisher = "IEEE",

pages = "547--549",

booktitle = "Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)",

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note = "IEEE International Conference on Micro Electro Mechanical Systems, MEMS ; Conference date: 24-01-2016 Through 28-01-2016",

}

Hoshian, S, Jokinen, V & Franssila, S 2016, Novel nanostructure replication process for robust superhydrophobic surfaces. in Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS). IEEE, pp. 547-549, IEEE International Conference on Micro Electro Mechanical Systems, Shanghai, China, 24/01/2016. https://doi.org/10.1109/MEMSYS.2016.7421683

TY - GEN

T1 - Novel nanostructure replication process for robust superhydrophobic surfaces

AU - Hoshian, Sasha

AU - Jokinen, Ville

AU - Franssila, Sami

N1 - Conference code: 29

PY - 2016/2/26

Y1 - 2016/2/26

N2 - This paper reports a novel nanoreplication process. It consists of metal nanostructuring by acidic etching, atomic layer deposition (ALD) of TiO2 and polymer replication. Due to excellent conformality of ALD, the nanostructures are accurately covered. After polydimethylsiloxane (PDMS) casting, the metal is completely etched away, revealing the nanostructured TiO2/PDMS surface. Because no peeling is used, even retrograde structures can be released easily. The surface is superhydrophobic, and it repels water, wine and coffee. The surface is both flexible and damage tolerant: it retains its Cassie-state superhydrophobicity even after wear and damage.

AB - This paper reports a novel nanoreplication process. It consists of metal nanostructuring by acidic etching, atomic layer deposition (ALD) of TiO2 and polymer replication. Due to excellent conformality of ALD, the nanostructures are accurately covered. After polydimethylsiloxane (PDMS) casting, the metal is completely etched away, revealing the nanostructured TiO2/PDMS surface. Because no peeling is used, even retrograde structures can be released easily. The surface is superhydrophobic, and it repels water, wine and coffee. The surface is both flexible and damage tolerant: it retains its Cassie-state superhydrophobicity even after wear and damage.

KW - Robust superhydrophobic

KW - Atomic layer deposition (ALD)

KW - nanoreplication

KW - titania-coated polymers

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M3 - Conference contribution

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SP - 547

EP - 549

BT - Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

PB - IEEE

T2 - IEEE International Conference on Micro Electro Mechanical Systems

Y2 - 24 January 2016 through 28 January 2016

ER -

Novel nanostructure replication process for robust superhydrophobic surfaces

Abstract

Publication series

Conference

Keywords

Access to Document

OtaNano - Nanofab

Raw Materials Research Infrastructure

Cite this