Nickel: A very fast diffuser in silicon

Jeanette Lindroos; David P. Fenning; Daniel J. Backlund; Erik Verlage; Angelika Gorgulla; Stefan K. Estreicher; Hele Savin; Tonio Buonassisi

doi:10.1063/1.4807799

Nickel: A very fast diffuser in silicon

Jeanette Lindroos
, David P. Fenning
, Daniel J. Backlund
, Erik Verlage
, Angelika Gorgulla
, Stefan K. Estreicher
, Hele Savin
, Tonio Buonassisi

Electron Physics Group (EPG)

Research output: Contribution to journal › Article › Scientific › peer-review

94 Citations (Scopus)

113 Downloads (Pure)

Original language	English
Journal	Journal of Applied Physics
Volume	113
Issue number	20
DOIs	https://doi.org/10.1063/1.4807799
Publication status	Published - 2013
MoE publication type	A1 Journal article-refereed

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy

Keywords

ab initio calculations
diffusion
elemental semiconductors
extrapolation
nickel
silicon

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10.1063/1.4807799

savin_nickel_a_very_2013Final published version, 925 KB

Cite this

@article{1683251e75d44d80beba63e2f436d796,

title = "Nickel: A very fast diffuser in silicon",

keywords = "ab initio calculations, diffusion, elemental semiconductors, extrapolation, nickel, silicon, ab initio calculations, diffusion, elemental semiconductors, extrapolation, nickel, silicon, ab initio calculations, diffusion, elemental semiconductors, extrapolation, nickel, silicon",

author = "Jeanette Lindroos and Fenning, \{David P.\} and Backlund, \{Daniel J.\} and Erik Verlage and Angelika Gorgulla and Estreicher, \{Stefan K.\} and Hele Savin and Tonio Buonassisi",

note = "VK: T40310",

year = "2013",

doi = "10.1063/1.4807799",

language = "English",

volume = "113",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "20",

}

TY - JOUR

T1 - Nickel: A very fast diffuser in silicon

AU - Lindroos, Jeanette

AU - Fenning, David P.

AU - Backlund, Daniel J.

AU - Verlage, Erik

AU - Gorgulla, Angelika

AU - Estreicher, Stefan K.

AU - Savin, Hele

AU - Buonassisi, Tonio

N1 - VK: T40310

PY - 2013

Y1 - 2013

KW - ab initio calculations

KW - diffusion

KW - elemental semiconductors

KW - extrapolation

KW - nickel

KW - silicon

KW - ab initio calculations

KW - diffusion

KW - elemental semiconductors

KW - extrapolation

KW - nickel

KW - silicon

KW - ab initio calculations

KW - diffusion

KW - elemental semiconductors

KW - extrapolation

KW - nickel

KW - silicon

UR - http://jap.aip.org/resource/1/japiau/v113/i20/p204906_s1

U2 - 10.1063/1.4807799

DO - 10.1063/1.4807799

M3 - Article

SN - 0021-8979

VL - 113

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 20

ER -

Nickel: A very fast diffuser in silicon

UN SDGs

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Nickel: A very fast diffuser in silicon

UN SDGs

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