Nickel: A very fast diffuser in silicon

Jeanette Lindroos, David P. Fenning, Daniel J. Backlund, Erik Verlage, Angelika Gorgulla, Stefan K. Estreicher, Hele Savin, Tonio Buonassisi

Research output: Contribution to journalArticleScientificpeer-review

52 Citations (Scopus)
33 Downloads (Pure)
Original languageEnglish
JournalJournal of Applied Physics
Volume113
Issue number20
DOIs
Publication statusPublished - 2013
MoE publication typeA1 Journal article-refereed

Keywords

  • ab initio calculations
  • diffusion
  • elemental semiconductors
  • extrapolation
  • nickel
  • silicon

Cite this