Nanoscale patterning of silicon with focused ion beam and anisotropic wer etching

Päivi Sievilä, Nikolai Chekurov, Ilkka Tittonen

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

Original languageEnglish
Title of host publicationPhysics Days, Jyväskylä, 11-13 March, Finland
Place of PublicationJyväskylä
PublisherFinnish Physical Society
Publication statusPublished - 2010
MoE publication typeA4 Conference publication

Publication series

PublisherThe Finnish Physical Society
ISSN (Print)0075-465X


  • focused ion beam
  • TMAH

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