Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics

Jenna Multia, Dmitry E. Kravchenko, Víctor Rubio-Giménez, Anish Philip, Rob Ameloot*, Maarit Karppinen*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

8 Citations (Scopus)
205 Downloads (Pure)

Abstract

Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal-organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.

Original languageEnglish
Pages (from-to)827-831
Number of pages5
JournalACS Applied Nano Materials
Volume6
Issue number2
Early online date10 Jan 2023
DOIs
Publication statusPublished - 27 Jan 2023
MoE publication typeA1 Journal article-refereed

Keywords

  • atomic layer deposition
  • krypton physisorption
  • metal-organic framework
  • methanol physisorption
  • molecular layer deposition
  • porous thin films

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