Nanoperforated silicon membranes fabricated by UV-nanoimprint lithography, deep reactive ion etching and atomic layer deposition

Lauri Sainiemi; Jukka Viheriälä; Tiina Sikanen; Janne Laukkanen; Tapio Niemi

doi:10.1088/0960-1317/20/7/077001

Nanoperforated silicon membranes fabricated by UV-nanoimprint lithography, deep reactive ion etching and atomic layer deposition

Lauri Sainiemi, Jukka Viheriälä, Tiina Sikanen, Janne Laukkanen, Tapio Niemi

Department of Chemistry and Materials Science

Research output: Contribution to journal › Article › Scientific › peer-review

19 Citations (Scopus)

Original language	English
Pages (from-to)	077001
Journal	Journal of Micromechanics and Microengineering
Volume	20
Issue number	7
DOIs	https://doi.org/10.1088/0960-1317/20/7/077001
Publication status	Published - 2010
MoE publication type	A1 Journal article-refereed

Keywords

chemical physics
electronics and devices
interfaces and thin films
physical chemistry
plasma physics
surfaces

Access to Document

10.1088/0960-1317/20/7/077001

Cite this

@article{75a8f68d5b8140ba8b8f7573dc9ab35d,

title = "Nanoperforated silicon membranes fabricated by UV-nanoimprint lithography, deep reactive ion etching and atomic layer deposition",

keywords = "chemical physics, electronics and devices, interfaces and thin films, physical chemistry, plasma physics, surfaces, chemical physics, electronics and devices, interfaces and thin films, physical chemistry, plasma physics, surfaces, chemical physics, electronics and devices, interfaces and thin films, physical chemistry, plasma physics, surfaces",

author = "Lauri Sainiemi and Jukka Viheri{\"a}l{\"a} and Tiina Sikanen and Janne Laukkanen and Tapio Niemi",

year = "2010",

doi = "10.1088/0960-1317/20/7/077001",

language = "English",

volume = "20",

pages = "077001",

journal = "Journal of Micromechanics and Microengineering",

issn = "0960-1317",

publisher = "Institute of Physics Publishing",

number = "7",

}

TY - JOUR

T1 - Nanoperforated silicon membranes fabricated by UV-nanoimprint lithography, deep reactive ion etching and atomic layer deposition

AU - Sainiemi, Lauri

AU - Viheriälä, Jukka

AU - Sikanen, Tiina

AU - Laukkanen, Janne

AU - Niemi, Tapio

PY - 2010

Y1 - 2010

KW - chemical physics

KW - electronics and devices

KW - interfaces and thin films

KW - physical chemistry

KW - plasma physics

KW - surfaces

KW - chemical physics

KW - electronics and devices

KW - interfaces and thin films

KW - physical chemistry

KW - plasma physics

KW - surfaces

KW - chemical physics

KW - electronics and devices

KW - interfaces and thin films

KW - physical chemistry

KW - plasma physics

KW - surfaces

UR - http://iopscience.iop.org/0960-1317/20/7/077001/

U2 - 10.1088/0960-1317/20/7/077001

DO - 10.1088/0960-1317/20/7/077001

M3 - Article

SN - 0960-1317

VL - 20

SP - 077001

JO - Journal of Micromechanics and Microengineering

JF - Journal of Micromechanics and Microengineering

IS - 7

ER -

Nanoperforated silicon membranes fabricated by UV-nanoimprint lithography, deep reactive ion etching and atomic layer deposition

Keywords

Access to Document

Other files and links

Raw Materials Research Infrastructure

Cite this

Nanoperforated silicon membranes fabricated by UV-nanoimprint lithography, deep reactive ion etching and atomic layer deposition

Keywords

Access to Document

Other files and links

Equipment

Raw Materials Research Infrastructure

Cite this