Nanolaminate structures fabricated by ALD for reducing propagation losses and enhancing the third-order optical nonlinearities

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review


  • Lasse Karvonen
  • Tapani Alasaarela
  • Henri Jussila
  • Soroush Mehravar
  • Ya Chen
  • Antti Säynätjoki
  • Robert A. Norwood
  • Nasser Peyghambarian
  • Khanh Kieu
  • Seppo Honkanen
  • Harri Lipsanen

Research units

  • University of Arizona
  • University of Eastern Finland


We demonstrate a novel atomic layer deposition (ALD) process to make high quality nanocrystalline titanium dioxide (TiO2) and zinc oxide (ZnO) with intermediate Al2O3 layers to limit the crystal size. The waveguide losses of TiO2/Al2O3 nanolaminates measured using the prism coupling method for both 633 nm and 1551 nm wavelengths are as low as 0.2 ± 0.1 dB/mm with the smallest crystal size. We also show that the third-order optical nonlinearity in ZnO/Al 2O3 nanolaminates can be enhanced by nanoscale engineering of the thin film structure.


Original languageEnglish
Title of host publicationOptical Components and Materials XI
EditorsMJF Digonnet, S Jiang
Publication statusPublished - 2014
MoE publication typeA4 Article in a conference publication
EventOptical Components and Materials - San Francisco, United States
Duration: 3 Feb 20145 Feb 2014
Conference number: 11

Publication series

NamePRoceedings of SPIE
ISSN (Print)0277-786X


ConferenceOptical Components and Materials
CountryUnited States
CitySan Francisco

    Research areas

  • Atomic layer deposition, Loss, Third-order optical nonlinearity

ID: 5579657