Nanocrystalline thin films synthesized from a Ti2AlN compound target by high power impulse magnetron sputtering technique

Teng Fei Zhang, Qi Min Wang*, Junghoon Lee, Peiling Ke, Roman Nowak, Kwang Ho Kim

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

20 Citations (Scopus)


Ti-Al-N thin films were synthesized utilizing a high power impulse magnetron sputtering (HIPIMS) from a Ti2AlN compound target. The deposition temperatures and bias voltages were varied in the range of room temperature (RT) to 450°C and 0V to -70V, respectively. It was indicated that amorphous films formed at low deposition temperatures of RT and 300°C, which changed into MAX-phase Ti2AlN films after vacuum annealing at 800°C for 1h. Densely packed nano-fibrous crystalline films mainly composing of Ti2AlN MAX phase and tetragonal Ti2N phase were acquired at deposition temperature of 450°C, which exhibited stable film structure during vacuum annealing at 800°C. The Ti2AlN-Ti2N composite films exhibited excellent oxidation and corrosion resistance, as compared to (Ti,Al)N film having same Ti/Al ratio and/or TiN film synthesized by a hybrid coating system with HIPIMS and DC pulse magnetron sputtering. The mechanical properties of the Ti2AlN-Ti2N films were also investigated in this work.

Original languageEnglish
Pages (from-to)199-206
Number of pages8
JournalSurface and Coatings Technology
Publication statusPublished - Nov 2012
MoE publication typeA1 Journal article-refereed


  • Corrosion
  • High power impulse magnetron sputtering (HIPIMS)
  • High resolution TEM (HRTEM)
  • MAX-phase films
  • Mechanical properties
  • Oxidation


Dive into the research topics of 'Nanocrystalline thin films synthesized from a Ti<sub>2</sub>AlN compound target by high power impulse magnetron sputtering technique'. Together they form a unique fingerprint.

Cite this