Abstract
We measure the response of a rotating sample of superfluid He-B3 to spin-down to rest in the zero-temperature limit. Deviations from perfect cylindrical symmetry in the flow environment cause the initial response to become turbulent. The remaining high polarization of vortices along the rotation axis suppresses the turbulent behavior and leads to laminar late-time response. We determine the dissipation during laminar decay at (0.13-0.22)Tc from the precession frequency of the remnant vortex cluster. We extract the mutual friction parameter α and confirm that its dependence on temperature and pressure agrees with theoretical predictions. We find that the zero-temperature extrapolation of α has pressure-independent value α(T=0)∼5×10-4, which we attribute to a process where Kelvin waves, excited at surfaces of the container, propagate into the bulk and enhance energy dissipation via overheating vortex core-bound fermions.
| Original language | English |
|---|---|
| Article number | 014527 |
| Pages (from-to) | 1-7 |
| Journal | Physical Review B |
| Volume | 97 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 29 Jan 2018 |
| MoE publication type | A1 Journal article-refereed |
Funding
We thank M. A. Silaev for useful discussions. This work was supported by the Academy of Finland (Grant No. 284594, LTQ CoE). Our research made use of the OtaNano Low Temperature Laboratory infrastructure of Aalto University, that is part of the European Microkelvin Platform.
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Dive into the research topics of 'Mutual friction in superfluid He- B 3 in the low-temperature regime'. Together they form a unique fingerprint.Projects
- 1 Finished
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Centre of Excellence in Low Temperature Quantum Phenomena and Devices
Eltsov, V. (Principal investigator), Prittinen, T. (Project Member), Rysti, J. (Project Member), Volovik, G. (Project Member) & Mäkinen, J. (Project Member)
01/01/2015 → 31/12/2017
Project: Academy of Finland: Other research funding
Equipment
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OtaNano – Low Temperature Laboratory
Savin, A. (Manager) & Rissanen, A. (Other)
OtaNanoFacility/equipment: Facility
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