Multiscale modeling of anisotropic wet chemical etching of crystalline silicon

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Original languageEnglish
Pages (from-to)467–473
Number of pages7
JournalEurophysics Letters
Volume60
Issue number3
Publication statusPublished - 2002
MoE publication typeA1 Journal article-refereed

    Research areas

  • ab initio, chemical etching, Monte Carlo

ID: 3399092