MOVPE growth of N-polar AlN on 4H-SiC: Effect of substrate miscut on layer quality

J. Lemettinen*, H. Okumura, I. Kim, C. Kauppinen, T. Palacios, S. Suihkonen

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

21 Citations (Scopus)
86 Downloads (Pure)


We present the effect of miscut angle of SiC substrates on N-polar AlN growth. The N-polar AlN layers were grown on C-face 4H-SiC substrates with a miscut towards 〈1¯100〉 by metal-organic vapor phase epitaxy (MOVPE). The optimal V/III ratios for high-quality AlN growth on 1° and 4° miscut substrates were found to be 20,000 and 1000, respectively. MOVPE grown N-polar AlN layer without hexagonal hillocks or step bunching was achieved using a 4H-SiC substrate with an intentional miscut of 1° towards 〈1¯100〉. The 200-nm-thick AlN layer exhibited X-ray rocking curve full width half maximums of 203 arcsec and 389 arcsec for (0 0 2) and (1 0 2) reflections, respectively. The root mean square roughness was 0.4 nm for a 2 μm×2μm atomic force microscope scan.

Original languageEnglish
Pages (from-to)12-16
Number of pages5
JournalJournal of Crystal Growth
Publication statusPublished - 1 Apr 2018
MoE publication typeA1 Journal article-refereed


  • A1. Polarity
  • A1. X-ray diffraction
  • A3. Metal-organic vapor phase epitaxy
  • B1. Nitrides
  • B2. Semiconducting aluminum compounds


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