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Modulation of GaAs(100) surface morphology by ultra-thin MOVPE grown InP layers

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    Abstract

    The impact of ultra-thin MOVPE grown InP layers on the surface morphology of GaAs(100) was studied in the InP/GaAs material system which is used to produce self-organized quantum dots through the Stranski-Krastanow (SK) growth mode. Temperature and InP coverage dependent 2D and 3D morphology regimes were discovered. At low temperatures the sample morphology remained 2D for all InP coverages up to the SK transition. Two dimensional morphology was achieved at higher temperatures only for samples with more than a complete monolayer of InP. Group V atom exchange during sample cooling was found to cause the morphology transition at smaller InP coverages.

    Original languageEnglish
    Title of host publicationPhysics of Semiconductors, Parts A and B
    EditorsJ Menendez, CG VanDeWalle
    PublisherAmerican Institute of Physics
    Pages117-118
    Number of pages2
    ISBN (Print)0735402574
    DOIs
    Publication statusPublished - 2005
    MoE publication typeA4 Conference publication
    EventInternational Conference on the Physics of Semiconductors - Flagstaff, United States
    Duration: 26 Jul 200430 Jul 2004
    Conference number: 27

    Publication series

    NameAIP Conference Proceedings
    PublisherAIP
    Volume772
    ISSN (Print)0094-243X

    Conference

    ConferenceInternational Conference on the Physics of Semiconductors
    Abbreviated titleICPS
    Country/TerritoryUnited States
    CityFlagstaff
    Period26/07/200430/07/2004

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