@techreport{8575e55e4bba43d6a68332c45e03a755,
title = "Modeling of the Growth of PECVD Silicon Nitride Films for Crystalline Silicon Solar Cells Using Response Surface Methodology",
keywords = "antireflection coating, ARC, factorial design, paswivating, PEVCD, response surface methodology, RSM, silicon nitride, antireflection coating, ARC, factorial design, paswivating, PEVCD, response surface methodology, RSM, silicon nitride, antireflection coating, ARC, factorial design, paswivating, PEVCD, response surface methodology, RSM, silicon nitride",
author = "Kjell Nybergh and T. Marjam{\"a}ki and Eija Skarp",
year = "1998",
language = "English",
series = "Twenty Sixth IEEE Photovoltaic Specialists Conference, Anaheim, CA, USA, 29 Sept - 3 Oct. 1997",
publisher = "Institute of Electrical and Electronics Engineers, Inc.",
pages = "143--146",
type = "WorkingPaper",
institution = "Institute of Electrical and Electronics Engineers, Inc.",
}