Mixed-Anion Compounds: An Unexplored Playground for ALD Fabrication

Tripurari Sharan Tripathi*, Maarit Karppinen*

*Corresponding author for this work

Research output: Contribution to journalReview Articlepeer-review

10 Citations (Scopus)
224 Downloads (Pure)


For decades the most successful approach towards new inorganic material innovations for next-generation devices has been to manipulate the cation composition. As this cation-centric material development is inevitably approaching its saturation, new chemistries are needed to maintain the pace of technological progress. One of the new chemistry approaches is to play with the anions instead of the cations. Moreover, advances in fabrication techniques are needed to address the endeavors to shrink the device and component dimensions. Here, the combination of mixed-anion chemistries, such as oxychalcogenides or carbopnictides, and the state-of-the-art atomic layer deposition (ALD) thin-film technology are highlighted. The unique bottom-up material building mode of ALD can lead to scientifically exciting but at the same time industry-feasible material innovations. In this brief review, the present status and prospects, and the challenges of this emerging field are discussed.

Original languageEnglish
Article number2100146
Number of pages14
JournalAdvanced Materials Interfaces
Issue number11
Early online date6 May 2021
Publication statusPublished - 9 Jun 2021
MoE publication typeA2 Review article, Literature review, Systematic review


  • atomic layer deposition
  • carbonitride
  • mixed-anion compound
  • oxyhalide
  • oxypnictide
  • oxysulfide
  • thin-film technology


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