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Method and apparatus

  • Samiul Haque (Inventor)
  • , Reijo K. Lehtiniemi (Inventor)
  • , Asta M. Kärkkäinen (Inventor)
  • , Lorenz Lechner (Inventor)
  • , Pertti Hakonen (Inventor)
    • Nokia Corporation

    Research output: Patent

    Abstract

    A method and apparatus, the method including: forming a recess in a graphene layer wherein the recess creates a boundary between a first portion of the graphene layer and a second portion of the graphene layer; depositing electrically insulating material within the recess; and depositing an electrically conductive material over the insulating material.

    Original languageEnglish
    Patent numberUS8865268B2
    IPCC23C 14/04; H01L 29/16; H01B 1/04
    Priority date28/04/2009
    Publication statusPublished - 21 Oct 2014
    MoE publication typeH1 Granted patent

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