Projects per year
Abstract
We study doping and metallization of black silicon (bSi) boron emitters formed by ion implantation or diffusion. We demonstrate that conformal metal layers can be deposited on bSi by electron beam evaporation. Raman spectroscopy shows that high boron concentrations (4·10 19 cm -3 ) are obtained in bSi by ion implantation, while maintaining emitter saturation current (J 0e ) below 20 fA/cm 2 with Al 2 O 3 passivation. In diffused bSi emitters, doping increases to twice the values of planar substrates, reaching values up to 7·1020 cm -3 . Those doping values allow specific contact resistivities down to (0.3 ± 0.2) mΩ·cm 2 on boron-implanted bSi surfaces with nickel or aluminum contacts.
Original language | English |
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Title of host publication | 2017 IEEE 44th Photovoltaic Specialists Conference (PVSC) |
Publisher | IEEE |
Pages | 944-947 |
Number of pages | 4 |
ISBN (Electronic) | 978-1-5090-5605-7 |
DOIs | |
Publication status | Published - 2018 |
MoE publication type | A4 Conference publication |
Event | IEEE Photovoltaic Specialists Conference - Washington, United States Duration: 25 Jun 2017 → 30 Jun 2017 Conference number: 44 |
Conference
Conference | IEEE Photovoltaic Specialists Conference |
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Abbreviated title | PVSC |
Country/Territory | United States |
City | Washington |
Period | 25/06/2017 → 30/06/2017 |
Keywords
- black silicon
- contact resistance
- emitter
- doping
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Dive into the research topics of 'Metallized Boron-Doped Black Silicon Emitters For Front Contact Solar Cells'. Together they form a unique fingerprint.Projects
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BUILDING INFORMATION MODELLING FOR LEAN CONSTRUCTION
Mirzaeifar, S. (Project Member), Paavola, J. (Principal investigator), Koskela, L. (Project Member), Dave, B. (Project Member) & Singoro, W. (Project Member)
01/01/2013 → 29/02/2016
Project: Business Finland: FiDiPro