Abstract
We have performed density functional calculations of oxygen incorporation and diffusion in monoclinic hafnia (HfO2) for a range of oxygen charge states. The calculations demonstrate that oxygen favors atomic incorporation and that O2− is the most stable species. We find that oxygen interstitials diffuse via exchange with lattice oxygen sites in hafnia, and that O− species have the smallest diffusion barrier.
| Original language | English |
|---|---|
| Article number | 225901 |
| Pages (from-to) | 1-4 |
| Number of pages | 4 |
| Journal | Physical Review Letters |
| Volume | 89 |
| Issue number | 22 |
| DOIs | |
| Publication status | Published - 2002 |
| MoE publication type | A1 Journal article-refereed |
Keywords
- ab initio
- diffusion
- high k
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