Original language | English |
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Pages (from-to) | 1129 |
Journal | Defect and Diffusion Forum |
Volume | 237-240 |
Publication status | Published - 2005 |
MoE publication type | A1 Journal article-refereed |
Mechanism of diffusion and dissociation of E-center in silicon
M. Ganchenkova, V. Borodin, R.M. Nieminen
Research output: Contribution to journal › Article › Scientific › peer-review